PRODUCTS & SERVICES
View All Products & ServicesTHANK YOU FOR YOUR INQUIRY. OUR TEAM WILL BE CONTACTING YOU SHORTLY.
CMP SLURRY PRODUCTS FOR SILICON CARBIDE SUBSTRATES
Ferro is a leading global manufacturer of optimized high-purity slurries designed to deliver optimal performance in metal CMP (chemical mechanical planarization) applications.
![Wafer Polishing Slurry-Ferro CMP Slurries for Silicon Wafter Polishing](png/cmp%20slurries%20for%20slicon%20carbide%20substratesf5f6.png)
POLISHING PERFORMANCE
![Polishing Performance of SN12500 Bulk Removal CMP Slurry for Silicon Wafers and Silicon Carbide Substrates](jpg/sn12500%20graph416x2322f88.jpg)
- Abrasive: Al2O3
- pH : 8 ~ 10
- 1-kit package (oxidant inside)
- Recyclable
- Suba 800 like pad recommended
- Ra = 0.7 ~ 0.9 Å (AFM)
- No scratch (Laser Tech.)
SN 12001 – FINE POLISH SLURRY FOR SILICON CARBIDE SUBSTRATES
POLISHING PERFORMANCE
![Polishing Performance SN12001 Fine Polishing Slurry for Silicon Wafers and Silicon Carbide Substrates](jpg/sn12001%20graph416x2327b69.jpg)
- Abrasive: colloidal silica
- pH : 8 ~ 10
- 2-kit package, mix two parts before use
- Oxidant: add oxidant before use
- Recyclable
- Soft polishing pad recommended
- Ra = 0.6 ~ 0.7Å (AFM)
![ELECTRONIC MATERIALS VALUE ADDED SERVICES](png/lab%20image8693.png)
VALUE ADDED SERVICES
With over 40 years of surface finishing experience, Ferro’s research, development and analytical resources enable us to develop unique polishes and abrasives for polishing a variety of substrates including plastic, glass, automotive clear coats, and sapphire.
Our expertise in abrasive particle development and manufacturing technology allows us to optimize the physical and chemical properties needed to deliver optimal solutions for our customers’ varied polishing applications.