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Surface Finishing and CMP Materials
We offer a wide range of aluminum, cerium and zirconium oxide-based polishing products custom formulated for our customers' ceramic, glass, metal and plastic substrate surface finishing requirements. Our CMP technology enables high-yield processes for next-generation devices.
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Aluminum Alloy and Stainless Steel Polishing Slurries
Ferro is a leading global manufacturer of optimized high-purity slurries with excellent stability designed for polishing aluminum alloy and stainless steel.
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Aluminum Oxide Automotive Powders and Polishes
Ferro is a leading global manufacturer of high-performance alumina abrasives that deliver excellent polishing performance for automotive clear coat surface finishing.
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Aluminum Oxide Plastic Lens Polishes
Ferro is a leading global manufacturer of high-purity, alumina-based plastic lens polishing compounds that deliver the excellent polishing performance and high-quality finished surfaces required for o ...
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CMP Slurries for Bare Silicon Wafers
Ferro is a leading global manufacturer of optimized high-purity slurries designed to deliver optimal performance in bare silicon wafer CMP (chemical mechanical planarization) applications.
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CMP Slurries for Reclaim Wafers
Ferro is a leading global manufacturer of optimized high-purity slurries with excellent stability designed for CMP polishing wafers for reclaim processing.
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CMP Slurries for Silicon Carbide Substrates
Ferro is a leading global manufacturer of optimized high-purity slurries designed to deliver optimal performance in metal CMP (chemical mechanical planarization) applications.
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Cerium Oxide Powders and Slurries for Glass Polishing
Ferro is a leading global manufacturer of high-performance cerium oxide and rare-earth oxide materials designed to deliver excellent polishing performance for many various glass polishing applications ...
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Cerium Oxide Slurries for STI CMP
Ferro offers a range of STI (shallow trench isolation) CMP solid state cerium oxide slurries designed to deliver low scratch performance from the 65nm node to 14nm and below.
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Copper Barrier CMP Slurries for Metal Removal
Copper Barrier CMP Slurries for Metal Removal
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Copper CMP Slurries for Metal Removal
Ferro is a leading global manufacturer of optimized high-purity copper CMP slurries designed to deliver optimal performance in metal CMP (chemical mechanical planarization) applications.
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Post CMP Cleaner
Ferro is a leading global manufacturer of optimized high-purity CMP cleaners designed to deliver optimal performance in post copper cleans for metal CMP (chemical mechanical planarization) application ...
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Silicon Oxide Slurries for Sapphire Polishes
Ferro manufactures a diverse portfolio of high purity silica-based aqueous slurries and suspensions designed for polishing sapphire substrates used in LEDs, camera lens covers, and fingerprint sensor ...
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Truplane 1631 Cerium Oxide Slurries for Dielectric CMP
Ferro is a leading global manufacturer of TruePlane® optimized high-purity cerium oxide-based polishing slurries designed to deliver optimal bulk oxide removal in dielectric CMP (chemical mechanical p ...
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Truplane 1731 Cerium Oxide Slurries for Dielectric CMP
Ferro is a leading global manufacturer of optimized high-purity cerium oxide-based polishing slurries designed to deliver optimal bulk oxide removal in dielectric CMP (chemical mechanical planarizatio ...
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Tungsten CMP Slurries for Metal Removal
Ferro is a leading global manufacturer of optimized high-purity tungsten CMP slurries designed to deliver optimal performance in metal CMP (chemical mechanical planarization) applications.
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Zirconium Oxide Powders and Slurries
Ferro is a leading global manufacturer of high-performance zirconium oxide glass polishing products designed to deliver excellent performance for relatively soft ophthalmic and precision optic substra ...
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