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POST CMP CLEANERS
Ferro is a leading global manufacturer of optimized high-purity CMP cleaners designed to deliver optimal performance in post copper cleans for metal CMP (chemical mechanical planarization) applications.
The GC14200 series is a line of advanced cleaners for post copper CMP processes that combines excellent cleaning performance with maximum copper surface protection.
- Free of surfactants
- Free of TMAH
- Excellent cleaning performance/efficiency
- Excellent Cu surface protection
- Good organic/particle residue removal
- Highly concentration ratio/wide for POU
- GC14200 is highly dilutable and offers a very broad POU dilution range
GC14200 CLEANING PERFORMANCE
| CRITERIA | GC142000 |
| ROUGHNESS (Å) | ~6 |
| DER (Å) | ~15.5 |
| DEFECT COUNTS (BW’S) | 0.22 |
| BTA RESIDUE (CU/BTA NORMALIZED | LOW |
| COPPER RECESS (Å) | 10 - 40 |
| CORROSION RATE (MMPY) | 0.092 |
GC14210 was designed for exceptionally low galvanic corrosion (DE Co-Cu) and is used in applications such as advanced semiconductor nodes where cobalt is used as the via interconnect.
With safety and performance in mind, GC 14200 contains no TMAH. It is also highly dilutable and offers a very broad POU dilution range.
VALUE ADDED SERVICES
With over 40 years of surface finishing experience, Ferro’s research, development and analytical resources enable us to develop unique polishes and abrasives for polishing a variety of substrates including plastic, glass, automotive clear coats, and sapphire.
Our expertise in abrasive particle development and manufacturing technology allows us to optimize the physical and chemical properties needed to deliver optimal solutions for our customers’ varied polishing applications.
